JOURNAL ARTICLE

Oxidation and etching of hydrogenated amorphous silicon; An in situ ellipsometry study

R. W. CollinsCe HuangH. Windischmann

Year: 1985 Journal:   Solar Energy Materials Vol: 12 (4)Pages: 289-298   Publisher: Elsevier BV
Keywords:
Etching (microfabrication) Ellipsometry Materials science Amorphous solid Microstructure Silicon Analytical Chemistry (journal) Layer (electronics) Isotropic etching In situ Amorphous silicon Thin film Chemistry Crystallography Nanotechnology Optoelectronics Composite material Crystalline silicon

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Topics

Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry
Silicon and Solar Cell Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
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