Kinetic ellipsometry study of the hydrogen plasma etching of hydrogenated amorphous silicon films

C. Godet; B. Drévillon

doi:10.1116/1.575576

ScienceGate Book Chapters

JOURNAL ARTICLE

Kinetic ellipsometry study of the hydrogen plasma etching of hydrogenated amorphous silicon films

C. Godet B. Drévillon

Year: 1988 Journal: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Vol: 6 (4)Pages: 2482-2489 Publisher: American Institute of Physics

DOI: 10.1116/1.575576

Get Full-Text PDF Get Analytical Report

Abstract

Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation C. Godet, B. Drevillon; Kinetic ellipsometry study of the hydrogen plasma etching of hydrogenated amorphous silicon films. Journal of Vacuum Science & Technology A 1 July 1988; 6 (4): 2482–2489. https://doi.org/10.1116/1.575576 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science & Technology A Search Advanced Search |Citation Search

Keywords:

Icon Amorphous silicon Citation Download Silicon Information retrieval Computer science World Wide Web Materials science Engineering physics Nanotechnology Physics Optoelectronics Crystalline silicon

Metrics

Cited By

1.04

FWCI (Field Weighted Citation Impact)

Refs

0.75

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Optical Coatings and Gratings

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Surface Roughness and Optical Measurements

Physical Sciences → Engineering → Computational Mechanics

Kinetic ellipsometry study of the hydrogen plasma etching of hydrogenated amorphous silicon films

Abstract

Metrics

Citation History

Topics

Related Documents

Selective Etching of Hydrogenated Amorphous Silicon by Hydrogen Plasma

Hydrogen plasma enhanced crystallization of hydrogenated amorphous silicon films

UHV Study of Hydrogen Atom Induced Etching of Amorphous Hydrogenated Silicon Thin Films

Oxidation and etching of hydrogenated amorphous silicon; An in situ ellipsometry study

Hydrogen-plasma etching of hydrogenated amorphous silicon: a study by a combination of spectroscopic ellipsometry and trap-limited diffusion model