JOURNAL ARTICLE
Polysilicon etching and profile control in a CCl4O2 plasma
Year: 1983 Journal: Vacuum Vol: 33 (6)Pages: 352-352 Publisher: Elsevier BV
Keywords:
Etching (microfabrication) Plasma Materials science Plasma etching Optoelectronics Nanotechnology Physics Layer (electronics) Nuclear physics
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Topics
Plasma Diagnostics and Applications
Physical Sciences → Engineering → Electrical and Electronic Engineering
Thin-Film Transistor Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
Copper Interconnects and Reliability
Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials
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