JOURNAL ARTICLE
6199. Pattern profile control of polysilicon plasma etching
Year: 1986 Journal: Vacuum Vol: 36 (10)Pages: 736-736 Publisher: Elsevier BV
Keywords:
Etching (microfabrication) Plasma etching Materials science Plasma Optoelectronics Reactive-ion etching Nanotechnology Layer (electronics) Physics
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Topics
Advanced Surface Polishing Techniques
Physical Sciences → Engineering → Biomedical Engineering
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
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