JOURNAL ARTICLE
Hydrogen Assisted Remote Plasma Enhanced Chemical Vapor Deposition of Amorphous Silicon Nitride Films
P. Santos-FilhoK. KohG. StevensG. Lucovsky
Year: 1995 Journal: MRS Proceedings Vol: 406 Publisher: Cambridge University Press
Keywords:
Materials science Chemical vapor deposition Silane Hydrogen Amorphous solid Plasma-enhanced chemical vapor deposition Stoichiometry Analytical Chemistry (journal) Silicon nitride Fourier transform infrared spectroscopy Deuterium Plasma Silicon Chemical engineering Nanotechnology Optoelectronics Composite material Crystallography Physical chemistry Atomic physics Organic chemistry Chemistry
Metrics
2
Cited By
0.00
FWCI (Field Weighted Citation Impact)
1
Refs
0.23
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Topics
Thin-Film Transistor Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
Copper Interconnects and Reliability
Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials
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