Formation of two-dimensional photonic crystals by electron-beam lithography

D. E. Utkin; Dmitry A. Nasimov

doi:10.1109/edm.2011.6006911

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Formation of two-dimensional photonic crystals by electron-beam lithography

D. E. Utkin Dmitry A. Nasimov

Year: 2011 Vol: 1 Pages: 119-121

DOI: 10.1109/edm.2011.6006911

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Abstract

The approach to formation of two-dimensional photonic crystals with preset sizes of elements by the electron-beam lithography (EBL) is presented. The main problems appearing during formation of these structures are considered.

Keywords:

Electron-beam lithography Lithography Photonic crystal Cathode ray Materials science Photonics Next-generation lithography Optics X-ray lithography Optoelectronics Stencil lithography Maskless lithography Beam (structure) Electron Resist Physics Nanotechnology

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Photonic Crystals and Applications

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Optical Coatings and Gratings

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Formation of two-dimensional photonic crystals by electron-beam lithography

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