Summary Abstract: Laser‐induced chemical etching of metals and semiconductors

Frances A. Houle; T. J. Chuang

doi:10.1116/1.571484

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Summary Abstract: Laser‐induced chemical etching of metals and semiconductors

Frances A. Houle T. J. Chuang

Year: 1982 Journal: Journal of Vacuum Science and Technology Vol: 20 (3)Pages: 790-791 Publisher: American Institute of Physics

DOI: 10.1116/1.571484

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Abstract

Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation F. A. Houle, T. J. Chuang; Summary Abstract: Laser‐induced chemical etching of metals and semiconductors. J. Vac. Sci. Technol. 1 March 1982; 20 (3): 790–791. https://doi.org/10.1116/1.571484 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science and Technology Search Advanced Search |Citation Search

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Topics

Laser Material Processing Techniques

Physical Sciences → Engineering → Computational Mechanics

Laser-induced spectroscopy and plasma

Physical Sciences → Engineering → Mechanics of Materials

Advanced Materials Characterization Techniques

Physical Sciences → Engineering → Biomedical Engineering

Summary Abstract: Laser‐induced chemical etching of metals and semiconductors

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