Summary Abstract: Chemical etching of silicon by CO2 laser-induced dissociation of NF3

James H. Brannon

doi:10.1116/1.583623

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Summary Abstract: Chemical etching of silicon by CO2 laser-induced dissociation of NF3

James H. Brannon

Year: 1987 Journal: Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena Vol: 5 (5)Pages: 1399-1399 Publisher: AIP Publishing

DOI: 10.1116/1.583623

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Abstract

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Keywords:

Dissociation (chemistry) Isotropic etching Materials science Etching (microfabrication) Chemistry Chemical engineering Nanotechnology Engineering Physical chemistry

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Topics

Laser Material Processing Techniques

Physical Sciences → Engineering → Computational Mechanics

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Summary Abstract: Chemical etching of silicon by CO2 laser-induced dissociation of NF3

Abstract

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