JOURNAL ARTICLE

Summary Abstract: Chemical etching of silicon by CO2 laser-induced dissociation of NF3

James H. Brannon

Year: 1987 Journal:   Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena Vol: 5 (5)Pages: 1399-1399   Publisher: AIP Publishing

Abstract

First Page

Keywords:
Dissociation (chemistry) Isotropic etching Materials science Etching (microfabrication) Chemistry Chemical engineering Nanotechnology Engineering Physical chemistry

Metrics

2
Cited By
0.50
FWCI (Field Weighted Citation Impact)
0
Refs
0.65
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Laser Material Processing Techniques
Physical Sciences →  Engineering →  Computational Mechanics
Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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