Laser-induced chemical etching of silicon in chlorine atmosphere

R. Kullmer; D. Bäuerle

doi:10.1007/bf00615502

ScienceGate Book Chapters

JOURNAL ARTICLE

Laser-induced chemical etching of silicon in chlorine atmosphere

R. Kullmer D. Bäuerle

Year: 1988 Journal: Applied Physics A Vol: 47 (4)Pages: 377-386 Publisher: Springer Science+Business Media

DOI: 10.1007/bf00615502

Get Full-Text PDF Get Analytical Report

Keywords:

Excimer laser Materials science Laser Etching (microfabrication) Irradiation Silicon Atom (system on chip) Isotropic etching Radiation Atomic physics Analytical Chemistry (journal) Atmosphere (unit) Chlorine Phase (matter) Optics Optoelectronics Chemistry Physics Nanotechnology

Metrics

Cited By

3.96

FWCI (Field Weighted Citation Impact)

Refs

0.94

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Laser Material Processing Techniques

Physical Sciences → Engineering → Computational Mechanics

Laser-induced spectroscopy and plasma

Physical Sciences → Engineering → Mechanics of Materials

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Laser-induced chemical etching of silicon in chlorine atmosphere

Metrics

Citation History

Topics

Related Documents

Laser-induced chemical etching of silicon in chlorine atmosphere

Laser-induced chemical etching of silicon in chlorine atmosphere

Laser-Induced Chemical Etching Of Silicon In Chlorine Atmosphere

Model of laser-induced chemical etching of silicon in chlorine atmosphere

Ar+ laser-induced chemical etching of molybdenum in chlorine atmosphere