KrF excimer laser crystallization of silicon thin films

S. Summers; H.S. Reehal; Graeme Hirst

doi:10.1023/a:1026543801619

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KrF excimer laser crystallization of silicon thin films

S. Summers H.S. Reehal Graeme Hirst

Year: 2000 Journal: Journal of Materials Science Materials in Electronics Vol: 11 (7)Pages: 557-563 Publisher: Springer Science+Business Media

DOI: 10.1023/a:1026543801619

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Keywords:

Materials science Raman spectroscopy Plasma-enhanced chemical vapor deposition Fluence Thin film Crystallinity Electron cyclotron resonance Amorphous solid Silicon Excimer laser Sputter deposition Analytical Chemistry (journal) Amorphous silicon Chemical vapor deposition Crystallization Sputtering Laser Optoelectronics Crystalline silicon Nanotechnology Plasma Crystallography Optics Chemical engineering Chemistry Composite material

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Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

KrF excimer laser crystallization of silicon thin films

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