Characterization of polycrystalline silicon thin films fabricated by excimer laser crystallization

Chil-Chyuan Kuo

doi:10.1007/s10946-007-0027-2

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Characterization of polycrystalline silicon thin films fabricated by excimer laser crystallization

Chil-Chyuan Kuo

Year: 2007 Journal: Journal of Russian Laser Research Vol: 28 (4)Pages: 383-392 Publisher: Springer Science+Business Media

DOI: 10.1007/s10946-007-0027-2

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Keywords:

Materials science Polycrystalline silicon Excimer laser Raman spectroscopy Transmission electron microscopy Thin film Microstructure Silicon Crystallite Scanning electron microscope Optoelectronics Laser Optics Composite material Thin-film transistor Nanotechnology Metallurgy

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Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon and Solar Cell Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Laser Material Processing Techniques

Physical Sciences → Engineering → Computational Mechanics

Characterization of polycrystalline silicon thin films fabricated by excimer laser crystallization

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