JOURNAL ARTICLE

Misfit accommodation and dislocations in heteroepitaxial semiconductor layers: \nII-VI compounds on GaAs

G. PatriarcheJ. P. RivièreJ. Castaing

Year: 1993 Journal:   Springer Link (Chiba Institute of Technology)   Publisher: Chiba Institute of Technology

Abstract

\nWe suggest a model for the nucleation and expansion of dislocations which accommodate \nthe parameter misfit of an epitaxial layer on a substrate, applied, in this work, \nto a II-VI compound on GaAs. We examine in particular the dislocations threading \nthrough the layer, which must be kept as low as possible in density.\n

Keywords:
Epitaxy Dislocation Layer (electronics) Nucleation Semiconductor Semiconductor materials Partial dislocations

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