JOURNAL ARTICLE
Challenges of High Aspect Ratio Oxide Etching
Year: 2008 Journal: ECS Meeting Abstracts Vol: MA2008-01 (19)Pages: 747-747 Publisher: Institute of Physics
Abstract
Abstract not Available.
Keywords:
Aspect ratio (aeronautics) Etching (microfabrication) Materials science Oxide Nanotechnology Optoelectronics Metallurgy
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Topics
Integrated Circuits and Semiconductor Failure Analysis
Physical Sciences → Engineering → Electrical and Electronic Engineering
Analytical Chemistry and Sensors
Physical Sciences → Chemical Engineering → Bioengineering
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
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