JOURNAL ARTICLE

Challenges of High Aspect Ratio Oxide Etching

Daniel KoehlerDominik Fischer

Year: 2008 Journal:   ECS Meeting Abstracts Vol: MA2008-01 (19)Pages: 747-747   Publisher: Institute of Physics

Abstract

Abstract not Available.

Keywords:
Aspect ratio (aeronautics) Etching (microfabrication) Materials science Oxide Nanotechnology Optoelectronics Metallurgy

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Topics

Integrated Circuits and Semiconductor Failure Analysis
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Analytical Chemistry and Sensors
Physical Sciences →  Chemical Engineering →  Bioengineering
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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