JOURNAL ARTICLE

Plasma deposited polycrystalline silicon films

Year: 1981 Journal:   Microelectronics Journal Vol: 12 (5)Pages: 41-41   Publisher: Elsevier BV
Keywords:
Polycrystalline silicon Materials science Silicon Plasma Crystallite Engineering physics Optoelectronics Composite material Metallurgy Engineering Thin-film transistor Physics Nuclear physics Layer (electronics)

Metrics

0
Cited By
0.00
FWCI (Field Weighted Citation Impact)
0
Refs
0.45
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Topics

Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry

Related Documents

JOURNAL ARTICLE

Plasma deposited polycrystalline silicon films

Journal:   Microelectronics Reliability Year: 1980 Vol: 20 (6)Pages: 911-912
JOURNAL ARTICLE

Polycrystalline silicon solar cells from recrystallized plasma deposited thin films

Kalluri R. SarmaR. LeggeR. W. Gurtler

Journal:   Journal of Electronic Materials Year: 1980 Vol: 9 (5)Pages: 841-856
JOURNAL ARTICLE

Chemically vapor deposited polycrystalline-silicon films

Journal:   Microelectronics Reliability Year: 1975 Vol: 14 (4)Pages: 344-345
JOURNAL ARTICLE

Chemically Vapor Deposited Polycrystalline-Silicon Films

T. I. Kamins

Journal:   IEEE Transactions on Parts Hybrids and Packaging Year: 1974 Vol: 10 (4)Pages: 221-229
© 2026 ScienceGate Book Chapters — All rights reserved.