Low-pressure Metalorganic Chemical Vapor Deposition and Characterization of YBa2Cu3O7−x Thin Films

P. Zawadzki; Gary S. Tompa; P. Norris; D. W. Noh; B. Gallois; C. S. Chern; R. Caracciolo; B. H. Kear

doi:10.1007/978-1-4684-7565-4_11

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Low-pressure Metalorganic Chemical Vapor Deposition and Characterization of YBa2Cu3O7−x Thin Films

P. Zawadzki Gary S. Tompa P. Norris D. W. Noh B. Gallois C. S. Chern R. Caracciolo B. H. Kear

Year: 1990 Pages: 127-138

DOI: 10.1007/978-1-4684-7565-4_11

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Keywords:

Metalorganic vapour phase epitaxy Chemical vapor deposition Materials science Analytical Chemistry (journal) Thin film Torr Annealing (glass) Partial pressure Hybrid physical-chemical vapor deposition Combustion chemical vapor deposition Mineralogy Carbon film Oxygen Epitaxy Chemistry Nanotechnology Metallurgy Layer (electronics)

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Physics of Superconductivity and Magnetism

Physical Sciences → Physics and Astronomy → Condensed Matter Physics

Copper Interconnects and Reliability

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Low-pressure Metalorganic Chemical Vapor Deposition and Characterization of YBa2Cu3O7−x Thin Films

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