JOURNAL ARTICLE

Metalorganic chemical vapor deposition of double-sided YBa2Cu3O7 thin films

William J. DeSistoH. S. NewmanR. L. HenryV. C. Cestone

Year: 1993 Journal:   Applied Physics Letters Vol: 62 (14)Pages: 1682-1684   Publisher: American Institute of Physics

Abstract

Thin films of YBa2Cu3O7−δ were deposited on both sides of (100) LaAlO3 substrates by metalorganic chemical vapor deposition. Using a gold-coated wafer carrier, improvements in both the transition temperature and critical current density of the film exposed to the carrier (first side) were demonstrated. Tc’s of 86–88 K and Jc’s≥106 A/cm2 at 77 K were achieved. The microwave surface resistance of both sides of double-sided samples measured at 77 K was approximately 8 mΩ at 36 GHz, scaling to less than 700 μΩ at 10 GHz.

Keywords:
Chemical vapor deposition Thin film Wafer Materials science Analytical Chemistry (journal) Metalorganic vapour phase epitaxy Combustion chemical vapor deposition Deposition (geology) Microwave Sheet resistance Carbon film Chemistry Optoelectronics Epitaxy Nanotechnology Layer (electronics)

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Topics

Physics of Superconductivity and Magnetism
Physical Sciences →  Physics and Astronomy →  Condensed Matter Physics
Magnetic properties of thin films
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Copper Interconnects and Reliability
Physical Sciences →  Materials Science →  Electronic, Optical and Magnetic Materials
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