Thickness-dependent optoelectronic properties of CuCr0.93Mg0.07O2 thin films deposited by reactive magnetron sputtering

Hui Sun; Mohammad Arab Pour Yazdi; C. Ducros; Sheng‐Chi Chen; Eric Aubry; Chao-Kuang Wen; J.H. Hsieh; Frédéric Sanchette; Alain Billard

doi:10.1016/j.mssp.2017.03.002

JOURNAL ARTICLE

Thickness-dependent optoelectronic properties of CuCr0.93Mg0.07O2 thin films deposited by reactive magnetron sputtering

Hui Sun Mohammad Arab Pour Yazdi C. Ducros Sheng‐Chi Chen Eric Aubry Chao-Kuang Wen J.H. Hsieh Frédéric Sanchette Alain Billard

Year: 2017 Journal: Materials Science in Semiconductor Processing Vol: 63 Pages: 295-302 Publisher: Elsevier BV

DOI: 10.1016/j.mssp.2017.03.002

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Keywords:

Materials science Figure of merit Thin film Transmittance Delafossite Sputtering Sputter deposition Band gap Optoelectronics Electrical resistivity and conductivity Optics Nanotechnology Metallurgy

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Copper-based nanomaterials and applications

Physical Sciences → Materials Science → Materials Chemistry

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Thickness-dependent optoelectronic properties of CuCr0.93Mg0.07O2 thin films deposited by reactive magnetron sputtering

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