Properties of aluminium oxide thin films deposited by reactive magnetron sputtering

Kari Koski; Jorma Hölsä; P. Juliet

doi:10.1016/s0040-6090(98)01232-2

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Properties of aluminium oxide thin films deposited by reactive magnetron sputtering

Kari Koski Jorma Hölsä P. Juliet

Year: 1999 Journal: Thin Solid Films Vol: 339 (1-2)Pages: 240-248 Publisher: Elsevier BV

DOI: 10.1016/s0040-6090(98)01232-2

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Keywords:

Materials science Thin film Amorphous solid Aluminium Sputtering Composite material Substrate (aquarium) Sputter deposition Surface roughness Elastic modulus Residual stress Oxide Metallurgy Analytical Chemistry (journal) Nanotechnology Chemistry Crystallography

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Properties of aluminium oxide thin films deposited by reactive magnetron sputtering

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