Properties of nickel oxide thin films deposited by RF reactive magnetron sputtering

LU Yu-qi; Wen-Shyang Hwang; Jiyoon YANG; Hung-Shiang Chuang

doi:10.1016/s0040-6090(02)00654-5

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Properties of nickel oxide thin films deposited by RF reactive magnetron sputtering

LU Yu-qi Wen-Shyang Hwang Jiyoon YANG Hung-Shiang Chuang

Year: 2002 Journal: Thin Solid Films Vol: 420-421 Pages: 54-61 Publisher: Elsevier BV

DOI: 10.1016/s0040-6090(02)00654-5

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Keywords:

Materials science Non-blocking I/O Thin film Sputtering Analytical Chemistry (journal) Nickel Substrate (aquarium) Electrical resistivity and conductivity Nickel oxide Sputter deposition Argon Cavity magnetron Metallurgy Chemistry Nanotechnology

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Transition Metal Oxide Nanomaterials

Physical Sciences → Materials Science → Polymers and Plastics

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

Properties of nickel oxide thin films deposited by RF reactive magnetron sputtering

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