Thickness dependent properties of nickel oxide thin films deposited by dc reactive magnetron sputtering

A. Mallikarjuna Reddy; A. Sivasankar Reddy; P. Sreedhara Reddy

doi:10.1016/j.vacuum.2011.02.002

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Thickness dependent properties of nickel oxide thin films deposited by dc reactive magnetron sputtering

A. Mallikarjuna Reddy A. Sivasankar Reddy P. Sreedhara Reddy

Year: 2011 Journal: Vacuum Vol: 85 (10)Pages: 949-954 Publisher: Elsevier BV

DOI: 10.1016/j.vacuum.2011.02.002

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Keywords:

Materials science Thin film Sputtering Electrical resistivity and conductivity Non-blocking I/O Nickel oxide Substrate (aquarium) Sputter deposition Transmittance Nickel Cavity magnetron Oxide Analytical Chemistry (journal) Optoelectronics Composite material Metallurgy Nanotechnology Chemistry Electrical engineering

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Transition Metal Oxide Nanomaterials

Physical Sciences → Materials Science → Polymers and Plastics

Thickness dependent properties of nickel oxide thin films deposited by dc reactive magnetron sputtering

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