Aluminium nitride thin films deposited by DC reactive magnetron sputtering

V. Dimitrova; D. Manova; T. Paskova; T S D Uzunov; Nikolay Ivanov; Dimitar Dechev

doi:10.1016/s0042-207x(98)00150-x

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Aluminium nitride thin films deposited by DC reactive magnetron sputtering

V. Dimitrova D. Manova T. Paskova T S D Uzunov Nikolay Ivanov Dimitar Dechev

Year: 1998 Journal: Vacuum Vol: 51 (2)Pages: 161-164 Publisher: Elsevier BV

DOI: 10.1016/s0042-207x(98)00150-x

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Keywords:

Materials science Microstructure Refractive index Indentation hardness Sputter deposition Aluminium Transmittance Sputtering Nitride Thin film Optoelectronics Aluminium nitride Cavity magnetron Composite material Analytical Chemistry (journal) Layer (electronics) Chemistry Nanotechnology

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GaN-based semiconductor devices and materials

Physical Sciences → Physics and Astronomy → Condensed Matter Physics

Acoustic Wave Resonator Technologies

Physical Sciences → Engineering → Biomedical Engineering

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Aluminium nitride thin films deposited by DC reactive magnetron sputtering

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