Particle Removal from Semiconductor Surfaces Using a Photon-Assisted, Gas-Phase Cleaning Process

Audrey C. Engelsberg

doi:10.1557/proc-315-255

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Particle Removal from Semiconductor Surfaces Using a Photon-Assisted, Gas-Phase Cleaning Process

Audrey C. Engelsberg

Year: 1993 Journal: MRS Proceedings Vol: 315 (1)Pages: 255-260 Publisher: Cambridge University Press

DOI: 10.1557/proc-315-255

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Keywords:

Materials science Contamination Semiconductor device fabrication Wet cleaning Wafer Semiconductor Particle (ecology) Contamination control Process engineering Nanotechnology Gas phase Chemical engineering Optoelectronics

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Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Atomic and Molecular Physics

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Electron and X-Ray Spectroscopy Techniques

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Particle Removal from Semiconductor Surfaces Using a Photon-Assisted, Gas-Phase Cleaning Process

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