Growth of AlN films using hydrazidoalane single-source precursors

Younsoo Kim; Jaehwan Kim; Jae Eun Park; B.J. Bae; Bongsoo Kim; Joon T. Park; Kyu-Sang Yu; Yunsoo Kim

doi:10.1016/s0040-6090(98)01355-8

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Growth of AlN films using hydrazidoalane single-source precursors

Younsoo Kim Jaehwan Kim Jae Eun Park B.J. Bae Bongsoo Kim Joon T. Park Kyu-Sang Yu Yunsoo Kim Kyu-Sang Yu Yunsoo Kim

Year: 1999 Journal: Thin Solid Films Vol: 339 (1-2)Pages: 200-202 Publisher: Elsevier BV

DOI: 10.1016/s0040-6090(98)01355-8

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Keywords:

X-ray photoelectron spectroscopy Crystallite Chemical vapor deposition Amorphous solid Nitride Materials science Scanning electron microscope Analytical Chemistry (journal) Diffraction Thin film Crystallography Chemistry Chemical engineering Nanotechnology Optics Composite material Layer (electronics) Organic chemistry

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GaN-based semiconductor devices and materials

Physical Sciences → Physics and Astronomy → Condensed Matter Physics

Acoustic Wave Resonator Technologies

Physical Sciences → Engineering → Biomedical Engineering

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Growth of AlN films using hydrazidoalane single-source precursors

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