Rui DongM. HasanHyejung ChoiDong‐Seon LeeM. B. PyunD. J. SeongHyunsang Hwang
The resistance switching characteristics of several metal oxides has been reported recently for nonvolatile memory applications (NVM). However, various issues such as the switching mechanisms, switching uniformity, scalability and reproducibility have not yet been solved. In this paper, we discuss the recent progress of switching mechanisms and switching behaviors of various materials.
Jr‐Hau HeWen-Yuan ChangJr‐Jian KeJosé Ramón Durán Retamal
Jyun-Bao YangTing‐Chang ChangJheng-Jie HuangShih-Ching ChenPo‐Chun YangYuting ChenHsueh-Chih TsengSimon M. SzeAnn‐Kuo ChuMing‐Jinn Tsai
Yang-Shun FanPo‐Tsun LiuLi-Feng TengChing-Hui Hsu
Susanne Hoffmann‐EifertRainer Waser
Shimeng YuByoungil LeeH.‐S. Philip Wong