JOURNAL ARTICLE

High-k Dielectrics and Dual Metal Gates: Integration Issues for New CMOS Materials

B. ClaflinK. FlockG. Lucovsky

Year: 1999 Journal:   MRS Proceedings Vol: 567   Publisher: Cambridge University Press
Keywords:
Materials science Metal gate Optoelectronics High-κ dielectric CMOS Gate dielectric Dielectric Nitride Capacitor Tin Metal Annealing (glass) Tantalum nitride Capacitance Electrode Gate oxide Electrical engineering Nanotechnology Voltage Transistor Metallurgy

Metrics

4
Cited By
0.39
FWCI (Field Weighted Citation Impact)
10
Refs
0.68
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Integrated Circuits and Semiconductor Failure Analysis
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Advancements in Semiconductor Devices and Circuit Design
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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