CMOS Integration Issues with High-K/Metal Gate Stack

Dim‐Lee Kwong

doi:10.1149/ma2005-02/13/566

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JOURNAL ARTICLE

CMOS Integration Issues with High-K/Metal Gate Stack

Dim‐Lee Kwong

Year: 2006 Journal: ECS Meeting Abstracts Vol: MA2005-02 (13)Pages: 566-566 Publisher: Institute of Physics

DOI: 10.1149/ma2005-02/13/566

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Abstract

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Keywords:

CMOS Stack (abstract data type) Metal gate High-κ dielectric Materials science Computer science Electronic engineering Electrical engineering Optoelectronics Gate oxide Engineering Transistor Operating system

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Integrated Circuits and Semiconductor Failure Analysis

Physical Sciences → Engineering → Electrical and Electronic Engineering

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

3D IC and TSV technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

CMOS Integration Issues with High-K/Metal Gate Stack

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