Dual Workfunction CMOS High-k - Metal Gates for High Performance Logic Technologies

Raj Jammy; Vijay Narayanan; E. Cartier

doi:10.1149/ma2005-02/13/556

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Dual Workfunction CMOS High-k - Metal Gates for High Performance Logic Technologies

Raj Jammy Vijay Narayanan E. Cartier

Year: 2006 Journal: ECS Meeting Abstracts Vol: MA2005-02 (13)Pages: 556-556 Publisher: Institute of Physics

DOI: 10.1149/ma2005-02/13/556

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Abstract

Abstract not Available.

Keywords:

CMOS Logic gate Pass transistor logic Computer science AND-OR-Invert Dual (grammatical number) Optoelectronics Materials science Electrical engineering Electronic engineering Logic family Computer architecture Logic synthesis Engineering Transistor Voltage

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Advancements in Semiconductor Devices and Circuit Design

Physical Sciences → Engineering → Electrical and Electronic Engineering

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Low-power high-performance VLSI design

Physical Sciences → Engineering → Electrical and Electronic Engineering

Dual Workfunction CMOS High-k - Metal Gates for High Performance Logic Technologies

Abstract

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