JOURNAL ARTICLE

High-K materials and metal gates for CMOS applications

John RobertsonRobert M. Wallace

Year: 2014 Journal:   Materials Science and Engineering R Reports Vol: 88 Pages: 1-41   Publisher: Elsevier BV
Keywords:
Materials science Metal gate Gate oxide Gate dielectric Optoelectronics High-κ dielectric Equivalent oxide thickness Time-dependent gate oxide breakdown CMOS Transistor Oxide Polycrystalline silicon Dielectric Threshold voltage Electronic engineering Nanotechnology Thin-film transistor Electrical engineering Layer (electronics) Metallurgy Voltage

Metrics

717
Cited By
22.38
FWCI (Field Weighted Citation Impact)
320
Refs
1.00
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Advancements in Semiconductor Devices and Circuit Design
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Semiconductor materials and interfaces
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics

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