JOURNAL ARTICLE

Capless annealing of silicon implanted gallium arsenide

J. D. GrangeDK Wickenden

Year: 1983 Journal:   Solid-State Electronics Vol: 26 (4)Pages: 313-317   Publisher: Elsevier BV
Keywords:
Annealing (glass) Materials science Silicon Gallium arsenide Ion implantation Optoelectronics Arsine Hall effect Ion Electron mobility Electrical resistivity and conductivity Metallurgy Chemistry Electrical engineering

Metrics

13
Cited By
5.80
FWCI (Field Weighted Citation Impact)
23
Refs
0.97
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Silicon and Solar Cell Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Semiconductor materials and interfaces
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics

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