JOURNAL ARTICLE

Characterization of Pb1- xLa xTiO3 Thin Films by the Radio Frequency Magnetron Sputtering Technique

Sang‐Shik ParkSu-Jin ChaeSoon‐Gil Yoon

Year: 1998 Journal:   Japanese Journal of Applied Physics Vol: 37 (4R)Pages: 1955-1955   Publisher: Institute of Physics

Abstract

Microstructures and electrical properties of polycrystalline and oriented (Pb 1- x La x )TiO 3 (PLT) thin films deposited by rf magnetron sputtering using a ceramic (Pb 0.7 La 0.3 )TiO 3 target having 20 mol% excess PbO were investigated. The grain size of oriented films deposited on La 0.5 Sr 0.5 CoO 3 (LSCO)/MgO was larger than that of polycrystalline PLT films on LSCO/Pt/Ti/SiO 2 /Si substrates. The dielectric constant and the dissipation factor of polycrystalline films measured at 10 kHz were 340 and 0.014, respectively. On the other hand, the dielectric constant and the dissipation factor of oriented films were 810 and 0.08, respectively. Both the polycrystalline and the oriented PLT films deposited at 500°C exhibited a paraelectric properties. The leakage current densities of the polycrystalline and the oriented PLT films were about 8.0 × 10 -8 and 2.5 × 10 -7 A/cm 2 at 10 kV/cm, respectively.

Keywords:
Crystallite Materials science Dissipation factor Dielectric Sputter deposition Thin film Microstructure Analytical Chemistry (journal) Grain size Sputtering Ceramic Mineralogy Composite material Optoelectronics Metallurgy Nanotechnology Chemistry

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