Preparation of Pyroelectric Pb_1-xLa_xTi_1-x/4O₃ Thin Films from Ceramic Target by RF Magnetron Sputtering

Abstract

Pyroelectric Pb 1- x La x Ti 1- x /4 O 3 thin films of high quality have been obtained reproducibly by rf magnetron sputtering using a ceramic target. The effects of sputtering parameters on film composition and structure have been studied and related to plasma emission spectroscopy. By controlling the relative intensities of Pb * (406 nm) and Ti * (396 nm) emissions of the plasma, the sputtering conditions were optimized to produce stoichiometric and highly c -axis-oriented filins. Under stabilized conditions, use of the ceramic target offered stability of the plasma and a high deposition rate of 2 Å/s. The PLT film exhibited good pyroelectric parameters with a dielectric constant of 290 and a pyroelectric coefficient of 4.2×10 -8 C/cm 2 · K.