Superconducting BaPb_1-xBi_xO₃ Thin Films by RF Magnetron Sputtering

Abstract

RF planar magnetron sputtering has been adopted for obtaining superconducting BaPb 1- x Bi x O 3 (BPB) thin films. Using a target with excess Pb and Bi, smoothly surfaced BPB films with T c above 9 K were obtained at a deposition rate as high as 400 Å/min. It was found that the film properties do not strongly depend on sputtering pressure and voltage as compared with that of the conventional sputtering method. Furthermore, the reproducibility has been greatly improved.