Superhard nanocomposite Ti1−Al N films prepared by magnetron sputtering

J. Musil; H. Hrubý

doi:10.1016/s0040-6090(00)00653-2

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Superhard nanocomposite Ti1−Al N films prepared by magnetron sputtering

J. Musil H. Hrubý

Year: 2000 Journal: Thin Solid Films Vol: 365 (1)Pages: 104-109 Publisher: Elsevier BV

DOI: 10.1016/s0040-6090(00)00653-2

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Keywords:

Materials science Nanocomposite Amorphous solid Sputter deposition Substrate (aquarium) Sputtering Indentation hardness Cavity magnetron Thin film Composite material Analytical Chemistry (journal) Phase (matter) Metallurgy Nanotechnology Crystallography Microstructure Chemistry

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Advanced ceramic materials synthesis

Physical Sciences → Materials Science → Ceramics and Composites

MXene and MAX Phase Materials

Physical Sciences → Materials Science → Materials Chemistry

Superhard nanocomposite Ti1−Al N films prepared by magnetron sputtering

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