Superhard nanocomposite Ti–Al–Si–N films deposited by reactive unbalanced magnetron sputtering

Ning Jiang; Y.G. Shen; H.J. Zhang; Sheng Bao; X. Y. Hou

doi:10.1016/j.mseb.2006.06.043

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Superhard nanocomposite Ti–Al–Si–N films deposited by reactive unbalanced magnetron sputtering

Ning Jiang Y.G. Shen H.J. Zhang Sheng Bao X. Y. Hou

Year: 2006 Journal: Materials Science and Engineering B Vol: 135 (1)Pages: 1-9 Publisher: Elsevier BV

DOI: 10.1016/j.mseb.2006.06.043

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Keywords:

X-ray photoelectron spectroscopy Materials science Lattice constant Grain size Nanoindentation Sputter deposition Sputtering Analytical Chemistry (journal) Microstructure Tin Nanocomposite Thin film Crystallography Diffraction Chemical engineering Nanotechnology Metallurgy Chemistry Optics

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Advanced ceramic materials synthesis

Physical Sciences → Materials Science → Ceramics and Composites

Boron and Carbon Nanomaterials Research

Physical Sciences → Materials Science → Materials Chemistry

Superhard nanocomposite Ti–Al–Si–N films deposited by reactive unbalanced magnetron sputtering

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