JOURNAL ARTICLE

Nanocomposite Ti–Si–N films deposited by reactive unbalanced magnetron sputtering at room temperature

Ning JiangY.G. ShenYiu‐Wing MaiTai L. ChanSimon C. Tung

Year: 2003 Journal:   Materials Science and Engineering B Vol: 106 (2)Pages: 163-171   Publisher: Elsevier BV
Keywords:
Materials science Nanoindentation Microstructure X-ray photoelectron spectroscopy Auger electron spectroscopy Sputter deposition Scanning electron microscope Nanocrystalline material Sputtering Titanium nitride Amorphous solid Surface roughness Silicon nitride Analytical Chemistry (journal) Silicon Composite material Thin film Nitride Crystallography Nanotechnology Metallurgy Chemical engineering Layer (electronics) Chemistry

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99
Cited By
11.79
FWCI (Field Weighted Citation Impact)
32
Refs
0.99
Citation Normalized Percentile
Is in top 1%
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Citation History

Topics

Metal and Thin Film Mechanics
Physical Sciences →  Engineering →  Mechanics of Materials
Diamond and Carbon-based Materials Research
Physical Sciences →  Materials Science →  Materials Chemistry
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
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