JOURNAL ARTICLE

Strained-layer 1.5 μm wavelength InGaAs/InP multiple quantum well lasers grown by chemical beam epitaxy

W. T. TsangMing C. WuLong YangY.K. ChenA. M. Sergent

Year: 1990 Journal:   Electronics Letters Vol: 26 (24)Pages: 2035-2036   Publisher: Institution of Engineering and Technology

Abstract

A substantial reduction is reported in the threshold current densities for 1.5 μm wavelength InxGa1−xAs/ InxGa1−xAs1−xPy, strained-layer multiple quantum well (SLMQW) lasers over lattice-matched MQW lasers. Threshold current density was found to depend sensitively on the InAs content x and thickness d of the InxGa1−xAs quantum wells. Threshold current densities as low as 370 A/cm2 and internal quantum efficiency of 90% were obtained for separate confinement heterostructure SL-MQW lasers having four quantum wells and with x = 0.65 and d = 5 nm. Such a threshold current density is among the lowest values obtained thus far for 1.5 μm wavelength InGaAs/lnGaAsP MQW lasers. The present lasers were grown by chemical beam epitaxy.

Keywords:
Molecular beam epitaxy Laser Quantum well Optoelectronics Materials science Heterojunction Current density Wavelength Semiconductor laser theory Chemical beam epitaxy Gallium arsenide Epitaxy Optics Layer (electronics) Semiconductor Physics Nanotechnology

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26
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6.86
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2
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0.98
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Citation History

Topics

Semiconductor Lasers and Optical Devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Semiconductor Quantum Structures and Devices
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics
Photonic and Optical Devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
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