В. П. ХвостиковЛ. С. ЛунинV. I. RatushnyiEduard OlivaM. Z. ShvartsО. А. Хвостикова
A low-temperature liquid phase epitaxy technique involving rapid cooling of a solution melt has been developed for the growth of epitaxial GaAs films on germanium substrates. Using this method, it is possible to obtain high-quality submicron GaAs epilayers on Ge substrates for photoelectric converters.
V. M. AndreevA. B. KazantsevВ. П. ХвостиковE.V. PaleevaV.D. RumyantsevS. V. Sorokina
Y. WangN. BaruchW. I. WangM. E. CheneyC.I. HuangR. Scherer
Abat MuratovAbat UteniyazovFatima T. Srajatdinova
Mantu K. HudaitS. B. Krupanidhi