Micro-structural and optical properties of reactive magnetron sputtered Aluminum Nitride (AlN) nanostructured films

B. Subramanian; Viswanathan Swaminathan; M. Jayachandran

doi:10.1016/j.cap.2010.06.016

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Micro-structural and optical properties of reactive magnetron sputtered Aluminum Nitride (AlN) nanostructured films

B. Subramanian Viswanathan Swaminathan M. Jayachandran

Year: 2010 Journal: Current Applied Physics Vol: 11 (1)Pages: 43-49 Publisher: Elsevier BV

DOI: 10.1016/j.cap.2010.06.016

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Keywords:

Materials science Wurtzite crystal structure Microstructure Scanning electron microscope Nitride Sputter deposition Cavity magnetron Band gap Thin film X-ray photoelectron spectroscopy Sputtering Optoelectronics Analytical Chemistry (journal) Composite material Nanotechnology Metallurgy Chemical engineering Layer (electronics) Zinc Chemistry

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GaN-based semiconductor devices and materials

Physical Sciences → Physics and Astronomy → Condensed Matter Physics

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Acoustic Wave Resonator Technologies

Physical Sciences → Engineering → Biomedical Engineering

Micro-structural and optical properties of reactive magnetron sputtered Aluminum Nitride (AlN) nanostructured films

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