Reactive magnetron sputtered AlN thin films: structural, linear and nonlinear optical characteristics

Haifa A. Alyousef; Ahmed M. Hassan; Hesham M.H. Zakaly

doi:10.1007/s10854-023-10459-x

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Reactive magnetron sputtered AlN thin films: structural, linear and nonlinear optical characteristics

Haifa A. Alyousef Ahmed M. Hassan Hesham M.H. Zakaly

Year: 2023 Journal: Journal of Materials Science Materials in Electronics Vol: 34 (13) Publisher: Springer Science+Business Media

DOI: 10.1007/s10854-023-10459-x

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Keywords:

Materials science Thin film Wurtzite crystal structure Refractive index Transmittance Sputter deposition Band gap Scanning electron microscope Optoelectronics Substrate (aquarium) Optics Nitride Cavity magnetron Sputtering Analytical Chemistry (journal) Composite material Layer (electronics) Nanotechnology Metallurgy

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GaN-based semiconductor devices and materials

Physical Sciences → Physics and Astronomy → Condensed Matter Physics

Acoustic Wave Resonator Technologies

Physical Sciences → Engineering → Biomedical Engineering

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Reactive magnetron sputtered AlN thin films: structural, linear and nonlinear optical characteristics

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