Structural and optical properties of RF magnetron sputtered aluminum nitride films without external substrate heating

Atul Vir Singh; Sudhir Chandra; Avanish Kumar Srivastava; B.R. Chakroborty; G. Sehgal; M. K. Dalai; G. Bose

doi:10.1016/j.apsusc.2011.06.065

ScienceGate Book Chapters

JOURNAL ARTICLE

Structural and optical properties of RF magnetron sputtered aluminum nitride films without external substrate heating

Atul Vir Singh Sudhir Chandra Avanish Kumar Srivastava B.R. Chakroborty G. Sehgal M. K. Dalai G. Bose

Year: 2011 Journal: Applied Surface Science Vol: 257 (22)Pages: 9568-9573 Publisher: Elsevier BV

DOI: 10.1016/j.apsusc.2011.06.065

Get Full-Text PDF Get Analytical Report

Keywords:

Materials science Substrate (aquarium) Sputter deposition Nitride Thin film Sputtering Optoelectronics Cavity magnetron Band gap Spectroscopy Transmission electron microscopy Analytical Chemistry (journal) Optics Nanotechnology Layer (electronics) Chemistry

Metrics

Cited By

0.22

FWCI (Field Weighted Citation Impact)

Refs

0.55

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

GaN-based semiconductor devices and materials

Physical Sciences → Physics and Astronomy → Condensed Matter Physics

Acoustic Wave Resonator Technologies

Physical Sciences → Engineering → Biomedical Engineering

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Structural and optical properties of RF magnetron sputtered aluminum nitride films without external substrate heating

Metrics

Citation History

Topics

Related Documents

Micro-structural and optical properties of reactive magnetron sputtered Aluminum Nitride (AlN) nanostructured films

Electrical Properties of Aluminum Nitride Thick Films Magnetron Sputtered on Aluminum Substrates

Deposition and characterization of c-axis oriented aluminum nitride films by radio frequency magnetron sputtering without external substrate heating

Optical properties of magnetron sputtered nanocrystalline gold nitride thin films

Properties of Magnetron‐Sputtered Silicon Nitride Films