Investigation of mask selectivities and diamond etching using microwave plasma-assisted etching

Dzung T. Tran; C. Fansler; T.A. Grotjohn; D.K. Reinhard; J. Asmussen

doi:10.1016/j.diamond.2010.02.001

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Investigation of mask selectivities and diamond etching using microwave plasma-assisted etching

Dzung T. Tran C. Fansler T.A. Grotjohn D.K. Reinhard J. Asmussen

Year: 2010 Journal: Diamond and Related Materials Vol: 19 (7-9)Pages: 778-782 Publisher: Elsevier BV

DOI: 10.1016/j.diamond.2010.02.001

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Keywords:

Etching (microfabrication) Diamond Argon Plasma etching Silicon Wafer Materials science Reactive-ion etching Dry etching Selectivity Analytical Chemistry (journal) Chemistry Nanotechnology Optoelectronics Metallurgy Layer (electronics)

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Topics

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advanced Surface Polishing Techniques

Physical Sciences → Engineering → Biomedical Engineering

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Investigation of mask selectivities and diamond etching using microwave plasma-assisted etching

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Citation History

Topics

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