Reactive ion etching of diamond using microwave assisted plasmas

François Silva; R.S. Sussmann; Fabien Bénédic; A. Gicquel

doi:10.1016/s0925-9635(02)00385-0

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Reactive ion etching of diamond using microwave assisted plasmas

François Silva R.S. Sussmann Fabien Bénédic A. Gicquel

Year: 2003 Journal: Diamond and Related Materials Vol: 12 (3-7)Pages: 369-373 Publisher: Elsevier BV

DOI: 10.1016/s0925-9635(02)00385-0

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Keywords:

Diamond Etching (microfabrication) Krypton Plasma Analytical Chemistry (journal) Microwave Reactive-ion etching Torr Chemistry Surface roughness Ion source Atomic physics Plasma etching Ion Excited state Materials science Xenon

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Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Plasma Diagnostics and Applications

Physical Sciences → Engineering → Electrical and Electronic Engineering

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Reactive ion etching of diamond using microwave assisted plasmas

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Citation History

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