JOURNAL ARTICLE

Waveguiding effects in laser-induced aqueous etching of semiconductors

D. V. PodlesnikH. H. GilgenRichard M. Osgood

Year: 1986 Journal:   Applied Physics Letters Vol: 48 (7)Pages: 496-498   Publisher: American Institute of Physics

Abstract

The rapid, ultraviolet-induced aqueous etching produces vertical, high-aspect features in GaAs samples of different crystal orientations. Much of the speed and anisotropy of the etching is attributed to the formation of efficient hollow, optical waveguides. These guides have been characterized by measuring the optical loss and the field distribution within the guide. The optical loss is typically small and does not restrict the etching of deep features.

Keywords:
Etching (microfabrication) Materials science Ultraviolet Laser Optoelectronics Anisotropy Optics Semiconductor Isotropic etching Crystal (programming language) Aqueous solution Reactive-ion etching Dry etching Nanotechnology Chemistry Physics

Metrics

58
Cited By
11.07
FWCI (Field Weighted Citation Impact)
6
Refs
0.99
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Photonic and Optical Devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Advanced MEMS and NEMS Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Laser Material Processing Techniques
Physical Sciences →  Engineering →  Computational Mechanics

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