Localized laser etching of compound semiconductors in aqueous solution

Richard M. Osgood; Antonio Sanchez‐Rubio; D. J. Ehrlich; V. Daneu

doi:10.1063/1.93113

ScienceGate Book Chapters

JOURNAL ARTICLE

Localized laser etching of compound semiconductors in aqueous solution

Richard M. Osgood Antonio Sanchez‐Rubio D. J. Ehrlich V. Daneu

Year: 1982 Journal: Applied Physics Letters Vol: 40 (5)Pages: 391-393 Publisher: American Institute of Physics

DOI: 10.1063/1.93113

Get Full-Text PDF Get Analytical Report

Abstract

A laser-based technique for rapid, anisotropic etching of compound semiconductors is described. Both holes for through-wafer vias and high-resolution diffraction gratings have been made with the process.

Keywords:

Wafer Materials science Etching (microfabrication) Compound semiconductor Semiconductor Laser Optoelectronics Isotropic etching Resolution (logic) Diffraction Aqueous solution Semiconductor laser theory Dry etching Optics Nanotechnology Chemistry Epitaxy Physical chemistry

Metrics

Cited By

14.17

FWCI (Field Weighted Citation Impact)

Refs

1.00

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Photonic and Optical Devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Laser Material Processing Techniques

Physical Sciences → Engineering → Computational Mechanics

Optical Coatings and Gratings

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Localized laser etching of compound semiconductors in aqueous solution

Abstract

Metrics

Citation History

Topics

Related Documents

Electrodeposition of ZnTe Compound Semiconductors from Aqueous Solution

Waveguiding effects in laser-induced aqueous etching of semiconductors

Laser-Induced Photochemical Dry Etching Of III-V Compound Semiconductors

Comparison of laser-induced etching behavior of III?V compound semiconductors

Compound Semiconductors: Characterization by Chemical Etching