JOURNAL ARTICLE
Comparison of laser-induced etching behavior of III?V compound semiconductors
Year: 1993 Journal: Applied Physics A Vol: 56 (4)Pages: 343-348 Publisher: Springer Science+Business Media
Keywords:
Etching (microfabrication) Materials science Laser Dry etching Reactive-ion etching Semiconductor Irradiation Optoelectronics Argon Isotropic etching Optics Nanotechnology Chemistry Layer (electronics)
Metrics
6
Cited By
0.69
FWCI (Field Weighted Citation Impact)
13
Refs
0.66
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Topics
Semiconductor Quantum Structures and Devices
Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics
Nanowire Synthesis and Applications
Physical Sciences → Engineering → Biomedical Engineering
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
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