Mesoporous silicon oxynitride thin films

Jiacheng Wang; Qian Liu

doi:10.1039/b513854j

ScienceGate Book Chapters

JOURNAL ARTICLE

Mesoporous silicon oxynitride thin films

Jiacheng Wang Qian Liu

Year: 2006 Journal: Chemical Communications Pages: 900-900 Publisher: Royal Society of Chemistry

DOI: 10.1039/b513854j

Get Full-Text PDF Get Analytical Report

Abstract

Highly-ordered, pore-modified with amine groups, and glass-like mesoporous silicon oxynitride thin films were prepared by heat treatment of as-synthesized mesoporous silica thin films in a flowing ammonia environment at high temperatures.

Keywords:

Mesoporous material Silicon oxynitride Materials science Silicon Chemical engineering Thin film Mesoporous silica Mesoporous organosilica Nanotechnology Organic chemistry Catalysis Silicon nitride Chemistry Optoelectronics

Metrics

Cited By

1.67

FWCI (Field Weighted Citation Impact)

Refs

0.83

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Mesoporous Materials and Catalysis

Physical Sciences → Materials Science → Materials Chemistry

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advanced ceramic materials synthesis

Physical Sciences → Materials Science → Ceramics and Composites

Mesoporous silicon oxynitride thin films

Abstract

Metrics

Citation History

Topics

Related Documents

Hydrogen in oxidized silicon oxynitride thin films

Properties of thin LPCVD silicon oxynitride films

Fabrication and Characterization of Silicon Oxynitride Thin Films

Characterization of PECVD deposited silicon oxynitride thin films

Characterization of PECVD deposited silicon oxynitride thin films