JOURNAL ARTICLE
Characterization of PECVD deposited silicon oxynitride thin films
Year: 1989 Journal: Vacuum Vol: 39 (10)Pages: 981-981 Publisher: Elsevier BV
Keywords:
Silicon oxynitride Plasma-enhanced chemical vapor deposition Characterization (materials science) Materials science Silicon Thin film Chemical engineering Optoelectronics Nanotechnology Silicon nitride
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Topics
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
Thin-Film Transistor Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
Advanced ceramic materials synthesis
Physical Sciences → Materials Science → Ceramics and Composites
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