JOURNAL ARTICLE

Characterization of PECVD deposited silicon oxynitride thin films

Year: 1989 Journal:   Vacuum Vol: 39 (10)Pages: 981-981   Publisher: Elsevier BV
Keywords:
Silicon oxynitride Plasma-enhanced chemical vapor deposition Characterization (materials science) Materials science Silicon Thin film Chemical engineering Optoelectronics Nanotechnology Silicon nitride

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Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Advanced ceramic materials synthesis
Physical Sciences →  Materials Science →  Ceramics and Composites

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