Hydrogen in oxidized silicon oxynitride thin films

J. B. Oude Elferink; F.H.P.M. Habraken; W. F. van der Weg; A. E. T. Kuiper

doi:10.1016/0169-4332(88)90378-9

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Hydrogen in oxidized silicon oxynitride thin films

J. B. Oude Elferink F.H.P.M. Habraken W. F. van der Weg A. E. T. Kuiper

Year: 1988 Journal: Applied Surface Science Vol: 33-34 Pages: 765-772 Publisher: Elsevier BV

DOI: 10.1016/0169-4332(88)90378-9

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Keywords:

Silicon oxynitride Silicon Hydrogen Materials science Thin film Chemical engineering Engineering physics Nanotechnology Chemistry Metallurgy Silicon nitride Organic chemistry Engineering

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0.82

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Topics

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Ga2O3 and related materials

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Hydrogen in oxidized silicon oxynitride thin films

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