JOURNAL ARTICLE
Characterization of silicon oxynitride thin films deposited by electron beam physical vapor deposition technique
K. C. MohiteYogesh B. KhollamA.B. MandaleK.R. PatilM.G. Takwale
Year: 2003 Journal: Materials Letters Vol: 57 (26-27)Pages: 4170-4175 Publisher: Elsevier BV
Keywords:
Silicon oxynitride Materials science Thin film X-ray photoelectron spectroscopy Refractive index Substrate (aquarium) Electron beam physical vapor deposition Anti-reflective coating Ellipsometry Silicon nitride Silicon Chemical vapor deposition Wafer Physical vapor deposition Analytical Chemistry (journal) Optoelectronics Optics Layer (electronics) Nanotechnology Chemical engineering Chemistry
Metrics
35
Cited By
1.88
FWCI (Field Weighted Citation Impact)
19
Refs
0.87
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
Thin-Film Transistor Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
ZnO doping and properties
Physical Sciences → Materials Science → Materials Chemistry
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