Tungsten-doped ZnO transparent conducting films deposited by direct current magnetron sputtering

Huafu Zhang; Liu Han-fa; Chengxin Lei; Yuan Changkun; Aiping Zhou

doi:10.1016/j.vacuum.2010.05.010

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Tungsten-doped ZnO transparent conducting films deposited by direct current magnetron sputtering

Huafu Zhang Liu Han-fa Chengxin Lei Yuan Changkun Aiping Zhou

Year: 2010 Journal: Vacuum Vol: 85 (2)Pages: 184-186 Publisher: Elsevier BV

DOI: 10.1016/j.vacuum.2010.05.010

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Keywords:

Materials science Tungsten Doping Sputter deposition Optoelectronics Sputtering Cavity magnetron Direct current Current (fluid) High-power impulse magnetron sputtering Thin film Metallurgy Nanotechnology Voltage Electrical engineering

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Ga2O3 and related materials

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Copper-based nanomaterials and applications

Physical Sciences → Materials Science → Materials Chemistry

Tungsten-doped ZnO transparent conducting films deposited by direct current magnetron sputtering

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